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Comparison of Al and Cu masks used for patterning boron-doped diamonds in oxygen plasma

Title statement	Comparison of Al and Cu masks used for patterning boron-doped diamonds in oxygen plasma / aut. Marián Marton, Mário Ritomský, Vlastimil Řeháček, Pavol Michniak, Miroslav Behúl, Patrik Novák, Ľubomír Vančo, Marian Vojs
Main entry-name	Marton, Marián, 1980- (Author) - FEI Ústav elektroniky a fotoniky
Another responsib.	Ritomský, Mário, 1993- (Author)
	Řeháček, Vlastimil, 1957- Z2 (Author) - FEI Ústav elektroniky a fotoniky
	Michniak, Pavol, 1986- Z2 (Author) - FEI Ústav elektroniky a fotoniky
	Behúl, Miroslav, 1989- Z2 (Author) - FEI Ústav elektroniky a fotoniky
	Novák, Patrik, 1987- Z2 (Author) - FEI Ústav jadrového a fyzikálneho inžinierstva
	Vančo, Ľubomír, 1983- Z2 (Author) - Centrum STU pre nanodiagnostiku
	Vojs, Marian, 1979- Z2 (Author) - FEI Ústav elektroniky a fotoniky
In	Journal of micromechanics and microengineering / Micromechanics and Microsystems Europe (MME 2018). -- ISSN 0960-1317. -- Vol. 29, No. 12 (2019), Art. no. 124004 [9] s.
Subj. Headings	boron doped diamond
	micro-patterning
	plasma etching
Language	English
URL	https://iopscience.iop.org/article/10.1088/1361-6439/ab4d6f
Document kind	RBX - článok z periodika
Category	ADC - Scientific titles in foreign carented magazines and noticed year-books
Category (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
In databases	CC: 000494762300002 DOI: 10.1088/1361-6439/ab4d6f SCOPUS: 2-s2.0-85076003899
Year	2019

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Number of the records: 1