Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing
Jeckell Zachary  Patel Dhruval Herschberg Andrew Choi Tag Barlaz David Bónová Lucia ; 067000 Shchelkanov Ivan Jurczyk Brian Ruzic David
Surfaces and Interfaces . Vol. 23, (2021), s. 1-8
atmospheric pressure plasma chemical vapor deposition silicon oxide lap shear strength barrier coating
https://www.sciencedirect.com/science/article/pii/S2468023021000663
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