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Atomistic Assessment of Melting Point Depression and Enhanced Interfacial Diffusion of Cu in Confinement with AlN

Title statement	Atomistic Assessment of Melting Point Depression and Enhanced Interfacial Diffusion of Cu in Confinement with AlN / aut. Yann L Müller, Lars P.H Jeurgens, Andrej Antušek, Vladyslav Turlo
Main entry-name	Müller, Yann L. (Author)
Another responsib.	Jeurgens, Lars P.H. (Author)
	Antušek, Andrej, 1973- Z2 (Author) - MTF Ústav výskumu progresívnych technológií
	Turlo, Vladyslav (Author)
Note	A+
In	ACS Applied Materials & Interfaces. -- ISSN 1944-8244. -- Vol. 14, iss. 22 (2022), s. 26099-26115
Subj. Headings	nanomultilayers
	metal ceramic interfaces
	melting point depression
	interfacial premelting
	interface diffusion
	molecular dynamics
Language	English
URL	https://pubs.acs.org/doi/pdf/10.1021/acsami.2c01347
Document kind	RBX - článok z periodika
Category	ADC - Scientific titles in foreign carented magazines and noticed year-books
Category (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
In databases	CC: 000810020300001 WOS: 000810020300001 DOI: 10.1021/acsami.2c01347 SCOPUS: 2-s2.0-85131746480
Year	2022

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Number of the records: 1