- Problems concerning the demolding process of nano imprint lithography
Number of the records: 1  

Problems concerning the demolding process of nano imprint lithography

  1. Title statementProblems concerning the demolding process of nano imprint lithography / aut. Jaroslava Škriniarová, Robert Andok, Magdaléna Kadlečíková, Juraj Nevřela
    Main entry-name Škriniarová, Jaroslava, 1954- (Author)
    Another responsib. Andok, Robert Z5 (Author)
    Kadlečíková, Magdaléna, 1956- Z2 (Author) - FEI Ústav elektroniky a fotoniky
    Nevřela, Juraj, 1989- Z2 (Author) - FEI Ústav elektroniky a fotoniky
    In APCOM 2022 [364 s.] / International conference on applied physics of condensed matter. -- Melville : AIP Publishing, 2023. -- ISBN 978-0-7354-4479-9. -- Art. no. 030011 [5] s.
    LanguageEnglish
    Document kindRZB - článok zo zborníka
    CategoryAFD - Reports at home scientific conferences
    Category (from 2022)V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka
    Type of documentpríspevok z podujatia
    In databases
    Year2023
    article

    article

Number of the records: 1  

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.