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Effect of Isochronal Annealing on MOS Structure Parameters Irradiated by Ar, Bi and Kr Heavy Ions in View of CV Measurement

  1. Title statementEffect of Isochronal Annealing on MOS Structure Parameters Irradiated by Ar, Bi and Kr Heavy Ions in View of CV Measurement
    Main entry-name Žiška, Milan, 1952- (Author) - FEI Ústav elektroniky a fotoniky
    Another responsib. Staňo, J. (Author)
    Skuratov, V.A. (Author)
    Translated titleVplyv teplotného žíhania na parametre MOS štruktúry ožiarenej ťažkými iónmi Ar, Bi a KR získané z CV merania
    In APCOM 2004. Applied Physics of Condensed Matter : Proceedings of the 10th International Workshop. Častá - Píla, Slovak Republic. 16.- 18. June 2004 /. -- 2004 : STU v Bratislave FEI, 2004. -- ISBN 80-227-2073-9. -- s.315-318
    LanguageEnglish
    Document kindRZB - článok zo zborníka
    CategoryAFD - Reports at home scientific conferences
    Category (from 2022)V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka
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