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Passivation of Si and a-Si:H surfaces by thin oxide and oxy-nitride layers

  1. Title statementPassivation of Si and a-Si:H surfaces by thin oxide and oxy-nitride layers
    Main entry-name Pinčík, Emil (Author)
    Another responsib. Kobayashi, Hikaru (Author)
    Rusnák, Ján (Author)
    Takahashi, Masao (Author)
    Brunner, Robert (Author)
    Jergel, M. (Author)
    Morales-Acevedo, A. (Author)
    Ortega, L. (Author)
    Kákoš, Jozef, 1951- (Author) - FCHPT Oddelenie keramiky, skla a cementu
    In Science Direct. -- 2006 (2006), s.nestr.
    LanguageEnglish
    Document kindRBX - článok z periodika
    CategoryADC - Scientific titles in foreign carented magazines and noticed year-books
    Category (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Year2007
    article

    article

Number of the records: 1  

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