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Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting
Title statement Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting / aut. Filip Chymo, Karol Fröhlich, Ivan Kundrata, Kristína Hušeková, Ladislav Harmatha, Juraj Racko, Juraj Breza, Miroslav Mikolášek Main entry-name Chymo, Filip, 1992- (Author) - FEI Ústav elektroniky a fotoniky Another responsib. Fröhlich, Karol 1954- (Author) Kundrata, Ivan, 1992- (Author) Hušeková, Kristína (Author) Harmatha, Ladislav, 1948- Z8 (Author) - FEI Ústav elektroniky a fotoniky Racko, Juraj, 1953- Z8 (Author) - FEI Ústav elektroniky a fotoniky Breza, Juraj, 1951- Z1 (Author) - FEI Ústav elektroniky a fotoniky Mikolášek, Miroslav, 1983- Z2 (Author) - FEI Ústav elektroniky a fotoniky In APCOM 2019 [231 s.] / International conference on applied physics of condensed matter. -- Melville : AIP Publishing, 2019. -- ISBN 978-0-7354-1873-8. -- Art. no. 020020 [4] s. Language English Document kind RZB - článok zo zborníka Category AFD - Reports at home scientific conferences Category (from 2022) V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka Year 2019 Citations [1] 2021: PASTUKHOVA, Nadiia - MAVRIC, Andraz - LI, Yanbo. Atomic Layer Deposition for the Photoelectrochemical Applications. In ADVANCED MATERIALS INTERFACES, 2021, vol., no., pp. ISSN 2196-7350. 2024: LEE, Soonil - WU, Shang-Hsuan - YU, Edward T. Wafer-Scale Si-Based Metal-Insulator-Semiconductor Photoanodes for Water Oxidation Fabricated Using Thin Film Reactions and Multiple-layer Electrodeposited Catalysts. In: ACS APPLIED ENERGY MATERIALS, 2024, vol. 7, no. 8, pp. 3253-3262. ISSN 2574-0962. 
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Number of the records: 1