Number of the records: 1  

Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting

  1. Title statementCharacterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting / aut. Filip Chymo, Karol Fröhlich, Ivan Kundrata, Kristína Hušeková, Ladislav Harmatha, Juraj Racko, Juraj Breza, Miroslav Mikolášek
    Main entry-name Chymo, Filip, 1992- (Author) - FEI Ústav elektroniky a fotoniky
    Another responsib. Fröhlich, Karol 1954- (Author)
    Kundrata, Ivan, 1992- (Author)
    Hušeková, Kristína (Author)
    Harmatha, Ladislav, 1948- Z8 (Author) - FEI Ústav elektroniky a fotoniky
    Racko, Juraj, 1953- Z8 (Author) - FEI Ústav elektroniky a fotoniky
    Breza, Juraj, 1951- Z1 (Author) - FEI Ústav elektroniky a fotoniky
    Mikolášek, Miroslav, 1983- Z2 (Author) - FEI Ústav elektroniky a fotoniky
    In APCOM 2019 [231 s.] / International conference on applied physics of condensed matter. -- Melville : AIP Publishing, 2019. -- ISBN 978-0-7354-1873-8. -- Art. no. 020020 [4] s.
    LanguageEnglish
    Document kindRZB - článok zo zborníka
    CategoryAFD - Reports at home scientific conferences
    Year2019
    Ohlasy[1] PASTUKHOVA, Nadiia - MAVRIC, Andraz - LI, Yanbo. Atomic Layer Deposition for the Photoelectrochemical Applications. In ADVANCED MATERIALS INTERFACES, 2021, vol., no., pp. ISSN 2196-7350. WOS ; SCOPUS
    article

    article

Number of the records: 1