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- Raman spectroscopy of silicon with nanostructured surface / aut. Magdaléna Kadlečíková, Ľubomír Vančo, Juraj Breza, Miroslav Mikolášek, Kristína Hušeková, Karol Fröhlich, Paul Procel, Miro Zeman, Olindo Isabella
Kadlečíková Magdaléna ; 033000 Vančo Ľubomír ; 060700 Breza Juraj ; 030530 Mikolášek Miroslav ; 033000 Hušeková Kristína Fröhlich Karol Procel Paul Zeman Miro Isabella Olindo
Optik . Vol. 257, (2022), Art. no. 168869 [11] s.
black silicon Nanolayer RuO2-IrO2 SERS
https://www.sciencedirect.com/science/article/pii/S0030402622002625
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- Investigating the quality of the silicon and black silicon interface for photovoltaic applications / aut. Peter Benko, Arpád Kósa, Jakub Drobný, Ladislav Harmatha, Miroslav Mikolášek, Ľubica Stuchlíková
Benko Peter ; 033000 Kósa Arpád ; 033000 Drobný Jakub ; 033000 Harmatha Ladislav ; 033000 Mikolášek Miroslav ; 033000 Stuchlíková Ľubica ; 033000
Mathematics, Information Technologies and Applied Sciences 2019 : . S. 14-22
solar panels black silicon nanostructured porous silicon electrically active defects
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- Defect distribution in metal-porous siliconsilicon structures / aut. Peter Benko, Ľubica Stuchlíková, Arpád Kósa, Jakub Drobný, Ladislav Harmatha, Miroslav Mikolášek, Martin Kopáni, Kentaro Imamura, Hikaru Kobayashi, Emil Pinčík
Benko Peter ; 033000 Stuchlíková Ľubica ; 033000 Kósa Arpád ; 033000 Drobný Jakub ; 033000 Harmatha Ladislav ; 033000 Mikolášek Miroslav ; 033000 Kopáni Martin Imamura Kentaro Kobayashi Hikaru Pinčík Emil
ADEPT 2019 : . S. 135-138
porous silicon black silicon defects DLTFS
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- Influence of the nucleation process on the properties of boron doped diamond films deposited on structured silicon / aut. Miroslav Behúl, Marian Vojs, Pavol Michniak, Marián Marton, Vlastimil Řeháček, Dong Wang, Andreas Herz, Peter Schaaf, Robert Redhammer
Behúl Miroslav ; 033000 Vojs Marian ; 033000 Michniak Pavol ; 033000 Marton Marián ; 033000 Řeháček Vlastimil ; 033000 Wang Dong Herz Andreas Schaaf Peter Redhammer Robert ; 033000
NANOCON 2015 : . S. 85-88
boron doped diamond reactive ion etching black silicon chemical vapour deposition
https://www.scopus.com/record/display.uri?eid=2-s2.0-84962890410&origin=resultslist&sort=plf-f&src=s&st1=Influence+of+the+nucleation+process+on+the+properties+of+boron+doped+diamond+films+deposited+on+structured+silicon&st2=&sid=78B9407404F65BE1864691E1824512AF.WeLimyRvBMk2ky9SFKc8Q%3a1080&sot=b&sdt=b&sl=121&s=TITLE%28Influence+of+the+nucleation+process+on+the+properties+of+boron+doped+diamond+films+deposited+on+structured+silicon%29&relpos=0&citeCnt=0&searchTerm=
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- Influence of the nucleation process on the properties of boron doped diamond films deposited on structured silicon / Miroslav Behúl, Marian Vojs, Pavol Michniak, Marián Marton, Vlastimil Řeháček, Dong Wang, Andreas Herz, Peter Schaaf, Robert Redhammer
Behúl Miroslav ; 033000 Vojs Marian ; E030 Michniak Pavol ; E030 Marton Marián ; E030 Řeháček Vlastimil ; E030 Wang Dong Herz Andreas Schaaf Peter Redhammer Robert ; E030
Proceedings of Abstracts, 7th International Conference NANOCON 2015, October 14 – 16 2015, Brno . [1] s.
boron doped diamond reactive ion etching black silicon chemical vapour deposition
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