Atomistic Assessment of Melting Point Depression and Enhanced Interfacial Diffusion of Cu in Confinement with AlN / aut. Yann L Müller, Lars P.H Jeurgens, Andrej Antušek, Vladyslav Turlo
Müller Yann L.  Jeurgens Lars P.H. Antušek Andrej ; 067000 Turlo Vladyslav
ACS Applied Materials & Interfaces . Vol. 14, iss. 22 (2022), s. 26099-26115
nanomultilayers metal ceramic interfaces melting point depression interfacial premelting interface diffusion molecular dynamics
https://pubs.acs.org/doi/pdf/10.1021/acsami.2c01347
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